Study on photoelectricity properties of SiCN thin films prepared by magnetron sputtering

Release time:2023-08-22 Hits:

Impact Factor6.4

DOI number:10.1016/j.jmrt.2021.08.043

Affiliation of Author(s):西北大学；荷语布鲁塞尔自由大学（VUB）；欧洲微电子中心（IMEC）

Journal:Journal of Materials Research and Technology

Place of Publication:荷兰

Key Words:SiCN；Thin films；Photoelectric properties；Magnetron sputtering

Note:共同第一作者，SCI检索，中科院一区，TOP期刊。

Indexed by:Journal paper

Document Code:10.1016/j.jmrt.2021.08.043

Discipline:Engineering

First-Level Discipline:Electronic Science and Techonology

Document Type:J

Volume:15

Page Number:460-467

Number of Words:6999

Translation or Not:no

Date of Publication:2021-12-01

Included Journals:SCI

Links to published journals:https://doi.org/10.1016/j.jmrt.2021.08.043

First Author:Qiang Li

First Author:Cheng Chen

Correspondence Author:Wu Zhao

All the Authors:Mingge Wang

All the Authors:Yaohui Lv

All the Authors:Yulu Mao

All the Authors:Manzhang Xu

All the Authors:Yingnan Wang

All the Authors:Xuewen Wang

All the Authors:Zhiyong Zhang

All the Authors:Shouguo Wang

All the Authors:Johan Stiens