Mechanism of electron-beam manipulation of single dopant atoms in silicon
Release time:2021-07-21
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DOI number:10.1021/acs.jpcc.1c03549
Journal:The Journal of Physical Chemistry C
Abstract:The precise positioning of dopant atoms within bulk crystal lattices could enable novel applications in areas including solid-state sensing and quantum computation. Established scanning probe techniques are capable tools for the manipulation of surface atoms, but at a disadvantage due to their need to bring a physical tip into contact with the sample. This has prompted interest in electron-beam techniques, followed by the first proof-of-principle experiment of bismuth dopant manipulation in crystalline silicon. Here, we use first-principles modeling to discover a novel indirect exchange mechanism that allows electron impacts to non-destructively move dopants with atomic precision within the silicon lattice. However, this mechanism only works for the two heaviest group V donors with split-vacancy configurations, Bi and Sb. We verify our model by directly imaging these configurations for Bi and by demonstrating that the promising nuclear spin qubit Sb can be manipulated using a focused electron beam.
Indexed by:Journal paper
Document Type:J
Volume:125
Issue:29
Page Number:16041
Translation or Not:no
Date of Publication:2021-07-21
Included Journals:SCI
First Author:Alexander Markevich
Correspondence Author:Andrew R. Lupini
Correspondence Author:Toma Susi
All the Authors:Bethany M. Hudak
All the Authors:Jacob Madsen
All the Authors:Jiaming Song
All the Authors:Paul C. Snijders